发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN VARNISH, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE RESIN CURED PRODUCT AND LIGHT GUIDE PATH FOR VISIBLE LIGHT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that gives a cured product having high transparency in a visible light wavelength region of 380 nm to 780 nm and excellent reliability in a high temperature and high humidity environment, and to provide a photosensitive resin varnish, a photosensitive resin film, a photosensitive resin cured product of the composition, and a light guide path for visible light formed of the cured product. <P>SOLUTION: The photosensitive resin composition contains (A) an acrylic polymer, (B) a polymerizable compound, (C) a photopolymerization initiator and (D) a hindered phenol-based antioxidant. The (B) polymerizable compound is a polyfunctional polymerizable compound having two or more polymerizable substituents in one molecule. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012053229(A) |
申请公布日期 |
2012.03.15 |
申请号 |
JP20100195075 |
申请日期 |
2010.08.31 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
MUKAI IKUO;TAKASAKI TOSHIHIKO;MITANI IKUE;OCHIAI MASAMI;NAKAMURA TAKESHI;TAKAHASHI ATSUSHI |
分类号 |
G03F7/004;C08F2/44;C08F2/50;G03F7/027;G03F7/033 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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