| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize a simple and highly cost-effective LPP system EUV light source. <P>SOLUTION: An LPP is formed using an LPP target system having a light source portion and a target portion. A pulsed laser beam 13 from the light source portion irradiates a Xenon ice 132F supplied by the target portion to an irradiation position. A GIC mirror is arranged relative to the LPP to receive an EUV at an input end and focus the received EUV at an intermediate focus adjacent to an output end. A radiation collection enhancement device having at least one funnel part may be used to increase the amount of the EUV supplied to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes a source-collector module (SOCOMO) is also disclosed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
