发明名称 PLASMA TORCH FOR TREATING WASTE AIR OF ETCHING PROCESSING
摘要 PURPOSE: A plasma torch for the treatment of waste gas in an etching process is provided to efficiently decompose fluorine compound included in wasted gas by efficient generation of plasma. CONSTITUTION: A plasma torch(100) comprises a cathode electrode(110). The cathode electrode comprises an insulation part(111) formed in the upper part thereof. The insulation part insulates a cover(190) and a cathode electrode. The plasma torch comprises a top cover(130) placed on the outside of the cathode electrode. The cover seals the upper cover on the opened part of the upper cover. The first insulation part(140) has a working gas injector(140a) for supplying the working gas to the cathode electrode. A body(150) comprises a cooling hole(150a). A thermal insulator(180) is fixed and coupled with the inner wall of the body and the first insulation part.
申请公布号 KR20120025122(A) 申请公布日期 2012.03.15
申请号 KR20100087309 申请日期 2010.09.07
申请人 UNISEM CO., LTD. 发明人 PARK, SUNG IL;YOON, TAE SANG;LEE, KEUN SOO;KIM, JE HO;KIM, GUN SEOB
分类号 H05H1/34;B23K10/00 主分类号 H05H1/34
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