发明名称 APPARATUS AND METHOD CONFIGURED TO LOWER THERMAL STRESSES
摘要 An apparatus and a method configured to lower thermal stress is disclosed. One embodiment provides a semiconductor chip, a heat sink plate and a layer structure. The layer structure includes at least a diffusion solder layer and a buffer layer. The layer structure is arranged between the semiconductor chip and the heat sink plate. The buffer layer includes a material, which is soft in comparison to a material of the diffusion solder layer, and includes a layer thickness such that thermal stresses in the semiconductor chip remain below a predetermined value during temperature fluctuations within a temperature range.
申请公布号 US2012061811(A1) 申请公布日期 2012.03.15
申请号 US201113228153 申请日期 2011.09.08
申请人 INFINEON TECHNOLOGIES AG 发明人 NELLE PETER;STECHER MATTHIAS
分类号 H01L23/495;H01L21/60 主分类号 H01L23/495
代理机构 代理人
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