| 摘要 |
<p>An antenna structure (2) comprising at least a non-conducting substrate (3) and an electrically conductive antenna line configuration (4', 4'', 4''') supported by the substrate (3), the electrically conductive antenna line configuration (4', 4'', 4''') being formed in an etching process by etching away locally by etchant an electrically conductive coating material supported by the substrate (3). The antenna structure (2) further comprises at least one electrically conductive tuning element (7) of the same electrically conductive coating material. The tuning element (7) is at least partly formed simultaneously with the electrically conductive antenna line configuration (4', 4'', 4''') in the same etching process, the tuning element having after the etching process dimensional shape and geometry to at least partly compensate the effect of over-or under-etching in the electrical properties of the antenna structure (2).</p> |
