发明名称 THERMAL INFRARED SENSOR AND MANUFACTURING METHOD THEREOF
摘要 A thermal infrared sensor includes an infrared ray absorbing film that is thermally separated from a semiconductor substrate by a hollow part; and a temperature sensor configured to detect temperature changes of the infrared ray absorbing film. The infrared ray absorbing film includes an infrared ray antireflection structure configured with a sub wavelength structure, the infrared ray antireflection structure being provided on a surface of the infrared ray absorbing film facing the semiconductor substrate.
申请公布号 US2012061569(A1) 申请公布日期 2012.03.15
申请号 US201113227681 申请日期 2011.09.08
申请人 NOGUCHI HIDETAKA;RICOH COMPANY, LTD. 发明人 NOGUCHI HIDETAKA
分类号 G01J5/02;H01L21/311 主分类号 G01J5/02
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