| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a conditioning method of an electron gun and an electron beam lithography apparatus that can effectively suppress abnormal discharge in an electron gun with high work efficiency. <P>SOLUTION: A conditioning method of an electron gun for gradually increasing a voltage applied between anode and Wehnelt electrodes to produce discharge on their surfaces comprises the steps of: measuring pressure in the electron gun, determining the minimum value of the pressure measurements; and comparing measurements with the minimum value to control the applied voltage. The voltage between the anode and Wehnelt electrodes is preferably applied when the pressure in the electron gun decreases below a predetermined value. Further, pressure measurements in the electron gun are preferably compared with the minimum value, and then the applied voltage is maintained for a predetermined time period, or the applied voltage is first decreased and then maintained for a predetermined time period. <P>COPYRIGHT: (C)2012,JPO&INPIT |
