| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a dustproof garment worn in a clean room when manufacturing a semiconcuctor device such as an LSI circuit or a VLSI circuit, or a liquid crystal display panel in the clean room, the dustproof garment being capable of suppressing contamination of the clean room caused by a gas generated from a human body. <P>SOLUTION: The dustproof garment 1 is configured in such a way that an atmospheric pressure in the dustproof garment is kept negative with respect to an atmospheric pressure of the clean room by sucking a gas in the dustproof garment during its wearing. Here, a head cover part 2 and a body covering part 3 of the dustproof garment are integrally formed, a ventilating fan 10 and a vent 11 from which air inside the dustproof garment is discharged by the ventilating fan 10 are prepared at a waist covering part of the dustproof garment, and a gas absorption can 12 is prepared between the ventilating fan 10 and the vent 11. <P>COPYRIGHT: (C)2012,JPO&INPIT |
