| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an advantageous technique for determining a light intensity distribution to be formed on a pupil plane of an illumination optical system. <P>SOLUTION: In an exposure device, a method comprises: a step S101 of setting a mask pattern disposed on an object surface of a projection optical system; a step S104 of setting a cut line for estimating an optical image of the mask pattern, on the image surface of the projection optical system; a step S110 of generating plural element light sources formed on a pupil plane of the illumination optical system so as to be different from each other; a step S112 of calculating an optical image of the mask pattern formed on the cut line set in the second step when the mask pattern is illuminated by each of the plural element light sources; and a step S114 of determining, as a light intensity distribution to be formed on the pupil plane of the illumination optical system, a light source achieved by combining the plural element light sources which are weighted so that the intermediate position between the edges on the cut line of the optical image of the mask pattern is made to approach to the a target position. <P>COPYRIGHT: (C)2012,JPO&INPIT |
