发明名称 |
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS |
摘要 |
Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
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申请公布号 |
US2012064456(A1) |
申请公布日期 |
2012.03.15 |
申请号 |
US201113229672 |
申请日期 |
2011.09.10 |
申请人 |
BAE YOUNG CHEOL;CARDOLACCIA THOMAS;SUN JIBIN;ARRIOLA DANIEL J.;FRAZIER KEVIN A.;DOW GLOBAL TECHNOLOGIES LLC;ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
BAE YOUNG CHEOL;CARDOLACCIA THOMAS;SUN JIBIN;ARRIOLA DANIEL J.;FRAZIER KEVIN A. |
分类号 |
G03F7/20;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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