RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER

摘要

PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition that can give a resist coating showing a high dynamic contact angle during exposure in an immersion exposure process, thereby showing excellent draining capability on the surface of the resist coating as well as high solubility with an alkali developing solution and with a rinsing liquid, and suppressing occurrence of a development defect.

SOLUTION: The radiation-sensitive resin composition contains [A] a polymer containing a structural unit (I) having a group expressed by formula (i); [B] a radiation-sensitive acid generator; and [C] a polymer having a lower content of fluorine atoms than that of the [A] polymer and having an acid-labile group.

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