RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND

摘要

The present invention relates to [A] a radiation-sensitive resin composition which contains a polymer having a constituent unit represented by formula (I). In formula (I), R1 represents a hydrogen atom or a methyl group; X represents a bivalent alicyclic hydrocarbon group which may have a substituent; Y represents a bivalent hydrocarbon group having 1-20 carbon atoms; and R2 represents a methyl group or a trifluoromethyl group. Y in formula (I) preferably represents an alkanediyl group having 2-4 carbon atoms. Preferably, the radiation-sensitive resin composition additionally contains [B] a radiation-sensitive acid generator.