Method of selecting a grid model for correcting grid deformations in a lithographic apparatus and lithographic assembly using the same
摘要
申请公布号
EP1744217(B1)
申请公布日期
2012.03.14
申请号
EP20060116659
申请日期
2006.07.05
申请人
ASML NETHERLANDS B.V.
发明人
SIMONS, HUBERTUS JOHANNES GERTRUDUS;MEGENS, HENRICUS JOHANNES LAMBERTUS;MOS, EVERHARDUS CORNELIS;VERSTAPPEN, LEONARDUS HENRICUS MARIE;WERKMAN, ROY;VERHOEVEN, HENRICUS JACOBUS MARIA
