| 摘要 |
PURPOSE: A chemical vapor deposition apparatus and a cleaning method thereof are provided to simply clean impurities which are deposited on the inner wall of a chamber without opening the chamber. CONSTITUTION: A susceptor(220) is arranged in the inner side of a chamber(210) and supports a substrate. A rotary motor(230) is installed in the lower side of the chamber. A processing gas supply device(251) supplies process gas to the substrate. A fuzzy gas supply part(252) supplies purge gas to the interval of an inner wall of the susceptor and the chamber. A cleaning gas to gas supply part(253) supplies cleaning gas to the interval of the inner wall of the susceptor and the chamber.
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