PURPOSE: A lid assembly for a plasma-etching apparatus is provided to change a structure which is clamped on the internal surface of a combining groove part to be clamped on the external surface of the combining groove, thereby significantly reducing pressure applied to a combining region. CONSTITUTION: A lid plate(100) is formed into a disc shape corresponding to a chamber. A penetration hole(110) is formed by penetrating the central part of the lid plate. A gas nozzle for spraying etching gas is installed in the penetration hole. A combining groove part(120) is formed into a downward concave shape along the circumference of the penetration hole. A combining part(200) which is inserted into the combining groove part is located on the bottom part of a clamp.
申请公布号
KR20120023986(A)
申请公布日期
2012.03.14
申请号
KR20100086463
申请日期
2010.09.03
申请人
SHEC CO., LTD.;WOO, BUM JE
发明人
PARK, KYUNG HO;WOO, BUM JE;CHANG, BONG SUK;KIM, HYUN WOO