发明名称 METHOD OF MANUFACTURING ELECTRONIC ELEMENT AND ELECTRONIC ELEMENT
摘要 <p>PURPOSE: An electric component and a manufacturing method thereof are provided to selectively process a wiring layer while controlling the influence of an organic insulating layer or a buffer layer contacting the top and bottom of the wiring layer. CONSTITUTION: Wiring layers(21,22) are formed on a substrate(11). An organic insulating layer(12) is formed on the wiring layer. A laser beam of a wavelength having transparency about the organic insulating layer is irradiated to short circuit unit(23) of the wiring layer through the organic insulating layer. A hole(25) is formed by eliminating a laser beam irradiation region of the short circuit unit. The pulse width of the laser beam is less than 100ns.</p>
申请公布号 KR20120024461(A) 申请公布日期 2012.03.14
申请号 KR20110085486 申请日期 2011.08.26
申请人 SONY CORPORATION 发明人 KAMATA MASANAO;YAMANA HIROAKI;YAGI IWAO;KAWASHIMA NORIYUKI
分类号 H01L51/56;G02F1/13;G02F1/1368 主分类号 H01L51/56
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