发明名称 |
METHOD OF MANUFACTURING ELECTRONIC ELEMENT AND ELECTRONIC ELEMENT |
摘要 |
<p>PURPOSE: An electric component and a manufacturing method thereof are provided to selectively process a wiring layer while controlling the influence of an organic insulating layer or a buffer layer contacting the top and bottom of the wiring layer. CONSTITUTION: Wiring layers(21,22) are formed on a substrate(11). An organic insulating layer(12) is formed on the wiring layer. A laser beam of a wavelength having transparency about the organic insulating layer is irradiated to short circuit unit(23) of the wiring layer through the organic insulating layer. A hole(25) is formed by eliminating a laser beam irradiation region of the short circuit unit. The pulse width of the laser beam is less than 100ns.</p> |
申请公布号 |
KR20120024461(A) |
申请公布日期 |
2012.03.14 |
申请号 |
KR20110085486 |
申请日期 |
2011.08.26 |
申请人 |
SONY CORPORATION |
发明人 |
KAMATA MASANAO;YAMANA HIROAKI;YAGI IWAO;KAWASHIMA NORIYUKI |
分类号 |
H01L51/56;G02F1/13;G02F1/1368 |
主分类号 |
H01L51/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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