| 摘要 |
1508660 Holograms; photo-resist materials and processing RCA CORPORATION 2 May 1975 [22 May 19741 18552/75 Headings G2C and G2X [Also in Division B3] A method of forming a surface relief pattern in [an] aluminium comprises (a) coating a photoresist 16 e.g. Shipley AZ 1350 on an aluminium substrate 12 (b) exposing the photo-resist to a light pattern e.g. using a laser (c) developing the photo-resist to give a surface relief pattern, Fig. 2 (d) transferring the surface relief pattern to the aluminium substrate by progressive removal of the resist and etching of the substrate (e) removing any remaining photo-resist and (f) anodizing the aluminium. The surface relief pattern is transferred to the aluminium substrate by chemical or sputter etching and the aluminium is anodized electro-chemically, thermally or in an oxygen plasma. The light pattern may be a focused image interference pattern i.e. a hologram and the etched aluminium substrate can be used as a master for duplicating the hologram in a thermoplastic e.g. polyvinyl chloride. |
