发明名称 ALIGNMENT MARKS IN SUBSTRATE HAVING THROUGH-SUBSTRATE VIA(TSV)
摘要 PURPOSE: An alignment mark of a substrate having through-substrate via is provided to improve accuracy of the formation of the alignment mark by forming functional through-substrate via while forming the alignment mark. CONSTITUTION: A wafer including a substrate is prepared. An interconnecting structure including a metal Line and via in inside is formed on the substrate. An alignment mark(14) is formed in the front of substrate. Through-substrate via is formed on the substrate. The through-substrate via comprises functional through-substrate via and alignment mark through-substrate via. The functional through-substrate via is formed in order to electrically connect a conductive feature of the front side of the substrate to a conductive feature of the rear side of the substrate.
申请公布号 KR20120024350(A) 申请公布日期 2012.03.14
申请号 KR20110001712 申请日期 2011.01.07
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHANG HSIN;TSAI FANG WEN;LIN JING CHENG;CHIOU WEN CHIH;JENG SHIN PUU
分类号 H01L23/544;H01L23/48 主分类号 H01L23/544
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