发明名称 |
ALIGNMENT MARKS IN SUBSTRATE HAVING THROUGH-SUBSTRATE VIA(TSV) |
摘要 |
PURPOSE: An alignment mark of a substrate having through-substrate via is provided to improve accuracy of the formation of the alignment mark by forming functional through-substrate via while forming the alignment mark. CONSTITUTION: A wafer including a substrate is prepared. An interconnecting structure including a metal Line and via in inside is formed on the substrate. An alignment mark(14) is formed in the front of substrate. Through-substrate via is formed on the substrate. The through-substrate via comprises functional through-substrate via and alignment mark through-substrate via. The functional through-substrate via is formed in order to electrically connect a conductive feature of the front side of the substrate to a conductive feature of the rear side of the substrate. |
申请公布号 |
KR20120024350(A) |
申请公布日期 |
2012.03.14 |
申请号 |
KR20110001712 |
申请日期 |
2011.01.07 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHANG HSIN;TSAI FANG WEN;LIN JING CHENG;CHIOU WEN CHIH;JENG SHIN PUU |
分类号 |
H01L23/544;H01L23/48 |
主分类号 |
H01L23/544 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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