发明名称 SHUTTERED GATE VALVE
摘要 Embodiments of gate valves and methods of using same are provided herein. In some embodiments, a gate valve for use in a process chamber may include a body having an opening disposed therethrough from a first surface to an opposing second surface of the body; a pocket extending into the body from a sidewall of the opening; a gate movably disposed within the pocket between a closed position that seals the opening and an open position that reveals the opening and disposes the gate completely within the pocket; and a shutter configured to selectively seal the pocket when the gate is disposed in the open position. In some embodiments, one or more heaters may be coupled to at least one of the body or the shutter.
申请公布号 KR20120024716(A) 申请公布日期 2012.03.14
申请号 KR20117029163 申请日期 2010.05.03
申请人 APPLIED MATERIALS, INC. 发明人 KITAMURA SHIN;FUKADA MITSUTOSHI
分类号 F16K3/30;F16K3/02;H01L21/02 主分类号 F16K3/30
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