发明名称 |
PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS WITH NEGATIVE BACK FOCUS OF THE ENTRY PUPIL |
摘要 |
PURPOSE: A projection objective lens and a projection exposure apparatus are provided to improve transparency by forming negative back focus of an entrance pupil. CONSTITUTION: A projection objective lens(210) forms an image projecting optical path(213) to an image plane(214) from an object plane(212). The projection objective lens has negative back focus of an entrance pupil. A microlithography projection exposure apparatus guides an illumination bundle(211) propagating to the object plane by crossing the image projecting optical path.
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申请公布号 |
KR20120024896(A) |
申请公布日期 |
2012.03.14 |
申请号 |
KR20120002600 |
申请日期 |
2012.01.09 |
申请人 |
CARL ZEISS SMT GMBH |
发明人 |
HANS JORGEN MANN;WOLFGANG SINGER |
分类号 |
G02B17/00;G02B13/24;G02B27/18;G03F7/20 |
主分类号 |
G02B17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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