发明名称 PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS WITH NEGATIVE BACK FOCUS OF THE ENTRY PUPIL
摘要 PURPOSE: A projection objective lens and a projection exposure apparatus are provided to improve transparency by forming negative back focus of an entrance pupil. CONSTITUTION: A projection objective lens(210) forms an image projecting optical path(213) to an image plane(214) from an object plane(212). The projection objective lens has negative back focus of an entrance pupil. A microlithography projection exposure apparatus guides an illumination bundle(211) propagating to the object plane by crossing the image projecting optical path.
申请公布号 KR20120024896(A) 申请公布日期 2012.03.14
申请号 KR20120002600 申请日期 2012.01.09
申请人 CARL ZEISS SMT GMBH 发明人 HANS JORGEN MANN;WOLFGANG SINGER
分类号 G02B17/00;G02B13/24;G02B27/18;G03F7/20 主分类号 G02B17/00
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