A SUBSTRATE TREATING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to change processing processes on a substrate to be suitable for each substrate by changing the processing processes for each row of the substrate. CONSTITUTION: A processing unit(3) processes a substrate(W). A single major carrying mechanism carries the substrate to the processing unit. A pick-up unit supplies a pure gas to a carrying space of the major carrying mechanism. An exhaust unit discharges the gas from the carrying space. The exhaust unit and the pick-up unit are laminated on the carrying space. An exposure device(EXP) exposures the substrate(T9).