| 摘要 |
PURPOSE: A polymer compound, chemically amplified negative resist composition, and a pattern forming method are provided to obtain fine pattern of high resolution and to improve line edge roughness. CONSTITUTION: A polymer compound includes one or more repeating units selected from repeating units based on N,N'-bis(alkoxymethyl)tetrahydropyrimidinone skeleton or N,N'-bis(hydroxymethyl)tetrahydropyrimidinon skeleton which is represented by chemical formula 1 or 2. In chemical formula 1, the A is hydrogen element, fluorine element, methyl group, or trifluoromethyl group; and the R2 is hydrogen element, C1 to C6 linear, branched, or cyclic monovalent hydrocarbon group. In chemical formula 2, the R2 is respective C1 to C6 linear, branched, or cyclic oxygen element containable monovalent hydrocarbon or halogen element. |
