发明名称 Field-effect transistor, semiconductor device including the field-effect transistor, and method of producing semiconductor device
摘要 A field-effect transistor includes a semi-insulating substrate, a source electrode, a drain electrode, a gate electrode, the electrodes being provided on the semi-insulating substrate, and a buried gate region which is provided under the gate electrode and in which an impurity is doped, wherein a concave slit is provided in the semi-insulating substrate, the slit being located between the gate electrode and the drain electrode and being adjacent to the buried gate region at the side of the drain electrode.
申请公布号 US8134182(B2) 申请公布日期 2012.03.13
申请号 US20060612879 申请日期 2006.12.19
申请人 NOMOTO KAZUKI;SONY CORPORATION 发明人 NOMOTO KAZUKI
分类号 H01L29/76 主分类号 H01L29/76
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