发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 <p>PURPOSE: A semiconductor device and a manufacturing method thereof are provided to arrange a plurality of opening parts on an etching mask with respect to a single pixel, thereby increasing the contact area of a contact opening part. CONSTITUTION: A first conductive layer is arranged on a substrate. A first insulating layer is arranged by covering the first conductive layer. A first semiconductor film, a second semiconductor film, and an impurity semiconductor film are arranged on the first insulating layer. A second conductive film(114) and a third conductive film(116) are arranged on a thin film laminated body(112) and the first insulating layer. An etching mask(117) is formed on the third conductive film.</p>
申请公布号 KR20120023572(A) 申请公布日期 2012.03.13
申请号 KR20110088348 申请日期 2011.09.01
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 MIYAIRI HIDEKAZU;MIZOGUCHI TAKAFUMI
分类号 H01L29/786;G02F1/136;H01L21/336 主分类号 H01L29/786
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