发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
<p>PURPOSE: A semiconductor device and a manufacturing method thereof are provided to arrange a plurality of opening parts on an etching mask with respect to a single pixel, thereby increasing the contact area of a contact opening part. CONSTITUTION: A first conductive layer is arranged on a substrate. A first insulating layer is arranged by covering the first conductive layer. A first semiconductor film, a second semiconductor film, and an impurity semiconductor film are arranged on the first insulating layer. A second conductive film(114) and a third conductive film(116) are arranged on a thin film laminated body(112) and the first insulating layer. An etching mask(117) is formed on the third conductive film.</p> |
申请公布号 |
KR20120023572(A) |
申请公布日期 |
2012.03.13 |
申请号 |
KR20110088348 |
申请日期 |
2011.09.01 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
MIYAIRI HIDEKAZU;MIZOGUCHI TAKAFUMI |
分类号 |
H01L29/786;G02F1/136;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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