发明名称 |
Method and apparatus of an inspection system using an electron beam |
摘要 |
Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer. The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen. |
申请公布号 |
US8134125(B2) |
申请公布日期 |
2012.03.13 |
申请号 |
US20080211343 |
申请日期 |
2008.09.16 |
申请人 |
IWABUCHI YUKO;TODOKORO HIDEO;MORI HIROYOSHI;SATO MITSUGU;USAMI YASUTSUGU;ICHIHASHI MIKIO;FUKUHARA SATORU;SHINADA HIROYUKI;KANEKO YUTAKA;SUGIYAMA KATSUYA;TAKAFUJI ATSUKO;TOYAMA HIROSHI;HITACHI, LTD. |
发明人 |
IWABUCHI YUKO;TODOKORO HIDEO;MORI HIROYOSHI;SATO MITSUGU;USAMI YASUTSUGU;ICHIHASHI MIKIO;FUKUHARA SATORU;SHINADA HIROYUKI;KANEKO YUTAKA;SUGIYAMA KATSUYA;TAKAFUJI ATSUKO;TOYAMA HIROSHI |
分类号 |
G01Q30/02;H01J37/28;G01N23/00;G01N23/20;G01N23/225;G21K1/08;G21K7/00;H01J37/22;H01J37/244;H01J37/256;H01L21/66 |
主分类号 |
G01Q30/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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