Imprint apparatus and imprint method

摘要

The present invention provides an imprint apparatus transferring a surface structure of a stamper to material to be patterned by allowing the stamper come in contact with the material to be patterned. The imprint apparatus includes a holding means that holds the material to be patterned and the stamper with a distance therebetween, a pressure reduction means that reduces pressure of a chamber in which the material to be patterned and the stamper are placed, and an alignment means that aligns the stamper with the material to be patterned.