发明名称 |
Method of aligning a substrate |
摘要 |
In a method of aligning a substrate, a first alignment mark in a single shot region on the substrate may be identified. A second alignment mark in the single shot region may be selectively identified in accordance with the identification of the first alignment mark. The substrate may then be aligned using identified any one of the first alignment mark and the second alignment mark. Thus, although the substrate may be accurately aligned, the accurately aligned substrate may not be determined to be misaligned. |
申请公布号 |
US8134709(B2) |
申请公布日期 |
2012.03.13 |
申请号 |
US20080277346 |
申请日期 |
2008.11.25 |
申请人 |
PEAK JONG-SUN;KIM YOUNG-SEOK;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PEAK JONG-SUN;KIM YOUNG-SEOK |
分类号 |
G01B11/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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