发明名称 Semiconductor device and method for manufacturing the same
摘要 In a semiconductor integrated circuit sandwiched between a pair of a first impact resistance layer and a second impact resistance layer, an impact diffusion layer is provided between the semiconductor integrated circuit and the second impact resistance layer. By provision of the impact resistance layer against the external stress and the impact diffusion layer for diffusing the impact, force applied to the semiconductor integrated circuit per unit area is reduced, so that the semiconductor integrated circuit is protected. The impact diffusion layer preferably has a low modulus of elasticity and high breaking modulus.
申请公布号 US8133749(B2) 申请公布日期 2012.03.13
申请号 US20090429201 申请日期 2009.04.24
申请人 EGUCHI SHINGO;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 EGUCHI SHINGO
分类号 H01L21/84 主分类号 H01L21/84
代理机构 代理人
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