发明名称 ADHESIVE FILM AND SEMICONDUCTOR WAFER PROCESSING TAPE
摘要 <p>Provided are a pressure-sensitive film and tape for semiconductor wafer processing, which are capable of reducing the occurrence of reflow cracks in packages, even if a package is picked up in a state in which a pressure-sensitive adhesive is attached to an adhesive layer. This pressure-sensitive film comprises a base film and a pressure-sensitive adhesive layer disposed on said base film, and is used to process semiconductor wafers. The loss in weight of the pressure-sensitive adhesive layer at the reflow temperature, as measured by differential thermal analysis, is not more than 1.5%. Furthermore, this tape for semiconductor wafer processing has a pressure-sensitive film comprising a base layer and a pressure-sensitive adhesive layer disposed on said base layer, and an adhesive layer disposed on the pressure-sensitive adhesive layer. The loss in weight of pressure-sensitive adhesive layer at the reflow temperature, as measured by differential thermal analysis, is not more than 1.5%.</p>
申请公布号 KR20120023595(A) 申请公布日期 2012.03.13
申请号 KR20117017581 申请日期 2010.11.11
申请人 FURUKAWA ELECTRIC CO., LTD. 发明人 AOYAMA MASAMI;ISHIWATA SHINICHI;MORISHIMA YASUMASA
分类号 C09J7/00;C09J7/02;H01L21/301 主分类号 C09J7/00
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