发明名称 SILICON CARBIDE SUBSTRATE PRODUCTION METHOD AND SILICON CARBIDE SUBSTRATE
摘要 <p>A method for manufacturing a silicon carbide substrate (1) includes the steps of: preparing a plurality of SiC substrates (20) each made of single-crystal silicon carbide; forming a base layer (10) made of silicon carbide and holding the plurality of SiC substrates (20), which are arranged side by side when viewed in a planar view; and forming a filling portion (60) filling a gap between the plurality of SiC substrates (20).</p>
申请公布号 KR20120023817(A) 申请公布日期 2012.03.13
申请号 KR20117030499 申请日期 2010.09.27
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 HARADA SHIN;SASAKI MAKOTO;NISHIGUCHI TARO;TAMASO HIDETO;NAMIKAWA YASUO
分类号 H01L21/20;H01L21/336;H01L29/78 主分类号 H01L21/20
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