| 摘要 |
PURPOSE: A substrate depositing apparatus is provided to improve the reliability of a deposition process by including an ion generator which plasmarizes reactive gas in a gas spray unit. CONSTITUTION: A gas spray unit sprays deposition gas to a substrate. An ion generator(130) sprays the plasmarized reactive gas through the gas spray unit after the reactive gas of the sprayed deposition gas is plasmarized. The gas spray unit includes a unit body and a spray buffer unit. Both sides of the unit body facing the substrate is horizontal to the incline of the substrate in a device housing(110). A spray buffer unit is formed on both sidewalls of the unit body and sprays the deposition gas to the substrate.
|
