APPARATUS OF EVAPORATION AND CONTROL METHOD THE SAME

摘要

PURPOSE: A deposition apparatus and a control method thereof are provided to arrange a plurality of reaction chambers for a single process of deposition and thereby prevent the stoppage of a corresponding cluster or whole line even when a portion of the reaction chambers are unable to be used. CONSTITUTION: A deposition apparatus comprises first to third chambers(6), a delivery chamber(5), and a control unit. The first chamber is to deposit a first source material on an object to be deposited, the second chamber is to deposit a second source material different from the first source material on the object, and the third chamber is to deposit the first source material on the object. The delivery chamber is connected to the first to third chambers to supply an object to be deposited to one of the first to third chambers. When an abnormal state of the first chamber is detected, the control unit sets the third chamber to the same condition as the first chamber and deposits a source material on an objet using the third chamber instead of the first chamber.