| 摘要 |
PURPOSE: An organic anti-reflection coating material and a composition for chromophore for organic anti-reflective layer including thereof are provided to absorb reflection light generated by exposure during lithographic process which forms super micro pattern using 193nm ArF excimer laser. CONSTITUTION: An organic anti-reflection coating material is represented by chemical formula 1. In the chemical formula 1, R1, R2, R3, R4 and R5 are respectively independent, and R1 and R4 are either hydrogen or methyl group, R2 is CH2, NH, O, or S, R3 is C1-6 alkyl group, C1-6 heteroalkyl group, C6-20 aryl group, C7-20 arylalkyl group, C4-20 heteroaryl radical, C5-20 hetero aryl alkyl group, C7-20 aryl hetero alkyl group, C3-10 vinyl alkyl, or C3-10 vinyl heteroalkyl group, R5 is hydrogen, C1-10 alcohol alkyl group, C1-10 hetero alcohol alkyl group, C1-10 carboxyl alkyl group, or C1-10 hetero carboxyl alkyl group. Also m and n respectively indicate a number which shows recurring unit within a main backbone. In the chemical formula 1, m plus n equals to 1, m is smaller than 0.05 and/(m+n)<0.95, and n is smaller than 0.05/(m+n)<0.95.
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