| 摘要 |
PURPOSE: A chemical vapor deposition apparatus is provided to minimize thermal expansion distortion and to improve uniformity of gas. CONSTITUTION: A chemical vapor deposition apparatus comprises: a back plate(200), a gas diffusing members(300A,300B), a shower head, a susceptor(500). The back plate has a gas introduction unit(210) at the center and is placed at the upper portion of a reaction space. The gas diffusion member is separately placed at the lower portion of the gas introduction member. The shawor head has a plurality of spray holes. The central part of the shower head is coupled to the gas diffusing member. The susceptor is separately placed at the lower portion of the shower head and supports a substrate(800).
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