| 摘要 |
PURPOSE:To obtain a double-structured electrode by the etching the side surfaces of the metal electrode after forming a transparent electrode film, a metal electrode film, and a photoregist film of a given pattern over a base plate, and etching is performed on these films to form a metal electrode and a transparent electrode. CONSTITUTION:A transparent conductive film 12 made of tin oxide is formed on a glass base plate 11, before a metal electrode film 13, which is made of chromium and used as a cardboard layer, is made to adhere to the film 12 by vapor deposition, and a thick metal electrode film 14 made of copper is formed on the film 13 by vapor deposition. The copper electrode film 14 is coated with a photoregist film of a given pattern. Etching is performed on the metal films 13 and 14 by using the photoregist film as a mask, thereby these films being formed into given electrode patterns. After that, etching is performed on the transparent electrode film 12 by using the photoregist film 15 and the metal electrode films 13 and 14 as a mask, being followed by the etching of the side surfaces of the films 13 and 14 which is performed by using the film 15 as a mask. Consequently, a double-structured electrode can be constituted by one patterning. |
