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发明名称
FORMING A RESIST PATTERN ON A SUBSTRATE
摘要
申请公布号
GB2000606(B)
申请公布日期
1982.01.13
申请号
GB19780027894
申请日期
1978.06.26
申请人
IBM CORP
发明人
分类号
H01L21/30;G03F7/30;G11B7/26;H01L21/027;(IPC1-7):G03C5/00
主分类号
H01L21/30
代理机构
代理人
主权项
地址
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