发明名称 Semiconductor device and method of fabricating the same
摘要 A semiconductor device includes a device formation region including a plurality of unit regions arranged in series to each other, each unit region comprising first and second active regions alternately arranged in series to each other. The first active region extends in a first direction. The second active region extends obliquely to the first direction. A plurality of first semiconductor pillars is arranged in the first direction and in each of the first active regions. A second semiconductor pillar is in each of the second active regions. A first bit line includes a first diffusion layer in the device formation region. The first diffusion layer extends under the plurality of first semiconductor pillars and the second semiconductor pillar. The first bit line connects the plurality of first semiconductor pillars and the second semiconductor pillar. A second bit line is electrically connected to the second semiconductor pillar.
申请公布号 US2012056255(A1) 申请公布日期 2012.03.08
申请号 US201113137615 申请日期 2011.08.30
申请人 ELPIDA MEMORY, INC. 发明人 SUKEKAWA MITSUNARI
分类号 H01L27/108;H01L29/78 主分类号 H01L27/108
代理机构 代理人
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