发明名称 Control Method and Apparatus
摘要 A higher-level controller can correct measured metrology data with residual error values as reported by a lower-level controller. This results in a more accurate process disturbance estimate. A method of control obtains, based on measurement sample definition, a first process variable of a system under control, determines a residual error using the first process variable and a first set point, controls the system using the residual error, obtains, based on the same sample definition, a second process variable, and adjusts the second process variable using the residual error. The method may also include determining, using the adjusted second process variable, one or more first set points for controlling the system by the low-level controller that may vary in correspondence with the sample definition.
申请公布号 US2012059505(A1) 申请公布日期 2012.03.08
申请号 US201113042928 申请日期 2011.03.08
申请人 MOS EVERHARDUS CORNELIS;HEPP BIRGITT NOELLE CORNELIA LIDUINE;MENGER JASPER THIJS;ASML NETHERLANDS B.V. 发明人 MOS EVERHARDUS CORNELIS;HEPP BIRGITT NOELLE CORNELIA LIDUINE;MENGER JASPER THIJS
分类号 G06F19/00 主分类号 G06F19/00
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