发明名称 |
METHOD FOR FORMING ANODIZED LAYER AND MOLD PRODUCTION METHOD |
摘要 |
<p>The method for forming an anodized layer comprises: a step for preparing an aluminum film or an aluminum substrate disposed on top of a supporting body; and a step for forming a porous alumina layer (10c) with fine recessed sections (10p), by applying voltage between an anode (E1) electrically connected to the surface of the aluminum film or the aluminum substrate and a cathode (E2) disposed in an electrolyte (E0), with the surface of the aluminum film or aluminum substrate in a state of being brought in contact with the electrolyte. The step for forming the porous alumina layer (10c) includes: a step for increasing the voltage to a target value; and a step for increasing the voltage to a first peak value lower than the target value before increasing the voltage to the target value, and then lowering the voltage to a value lower than the first peak value. The present invention enables the formation of an anodized layer with reduced variation in the recessed sections.</p> |
申请公布号 |
WO2012029570(A1) |
申请公布日期 |
2012.03.08 |
申请号 |
WO2011JP68839 |
申请日期 |
2011.08.22 |
申请人 |
SHARP KABUSHIKI KAISHA;ISURUGI AKINOBU;MINOURA KIYOSHI;HAYASHI HIDEKAZU;NAKAMATSU KENICHIRO |
发明人 |
ISURUGI AKINOBU;MINOURA KIYOSHI;HAYASHI HIDEKAZU;NAKAMATSU KENICHIRO |
分类号 |
C25D11/04;B29C33/38;B29C59/02;B29L11/00;C25D11/24;G02B1/11 |
主分类号 |
C25D11/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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