发明名称 METHOD FOR FORMING ANODIZED LAYER AND MOLD PRODUCTION METHOD
摘要 <p>The method for forming an anodized layer comprises: a step for preparing an aluminum film or an aluminum substrate disposed on top of a supporting body; and a step for forming a porous alumina layer (10c) with fine recessed sections (10p), by applying voltage between an anode (E1) electrically connected to the surface of the aluminum film or the aluminum substrate and a cathode (E2) disposed in an electrolyte (E0), with the surface of the aluminum film or aluminum substrate in a state of being brought in contact with the electrolyte. The step for forming the porous alumina layer (10c) includes: a step for increasing the voltage to a target value; and a step for increasing the voltage to a first peak value lower than the target value before increasing the voltage to the target value, and then lowering the voltage to a value lower than the first peak value. The present invention enables the formation of an anodized layer with reduced variation in the recessed sections.</p>
申请公布号 WO2012029570(A1) 申请公布日期 2012.03.08
申请号 WO2011JP68839 申请日期 2011.08.22
申请人 SHARP KABUSHIKI KAISHA;ISURUGI AKINOBU;MINOURA KIYOSHI;HAYASHI HIDEKAZU;NAKAMATSU KENICHIRO 发明人 ISURUGI AKINOBU;MINOURA KIYOSHI;HAYASHI HIDEKAZU;NAKAMATSU KENICHIRO
分类号 C25D11/04;B29C33/38;B29C59/02;B29L11/00;C25D11/24;G02B1/11 主分类号 C25D11/04
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