NOZZLE HEAD AND APPARATUS

摘要

The present invention relates to an apparatus and nozzle head for coating a surface (4) of a substrate (6). The apparatus comprising a process chamber (26) having inside a gas atmosphere (14), a nozzle head (2) arranged inside the process chamber (26), precursor supply and discharge means. The nozzle head (2) comprising one or more first precursor nozzles (8) for subjecting the surface (4) of the substrate (6) to the first precursor (A), one or more second precursor nozzles (10) for subjecting the surface (4) of the substrate (6) to the second precursor (B) and one or more purge gas channels (12) between the first and second precursor zones (8, 10). In the present invention the purge gas channel (12) is at least partly open to the gas atmosphere (14) comprising purge gas for subjecting the surface (4) of the substrate (6) to purge gas.