| 摘要 |
<P>PROBLEM TO BE SOLVED: To dissolve an uneven current density caused by a spherical aberration, by a method different from a method for reducing a spherical aberration to obtain uniform current density distribution on a first formation opening plate 3 (or iris) in a variable formation electron beam lithography device. <P>SOLUTION: In a charged particle beam device comprising: a charged particle source; an illumination lens group; an iris; a projection lens group; and a material plane disposed in this order, the charged particle beam output from the charged particle source is radiated on the iris via the illumination lens group. In the state of the iris image imaged on the material plane by the projection lens, the beam passing through the iris is radiated on the material. The illumination lens group is disposed in a manner not to image the charged particle source image on the iris, and further, one lens of the illumination lens group is disposed in a position having optical conjugation relationship with the iris position. <P>COPYRIGHT: (C)2012,JPO&INPIT |
