| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent air in a space for imprint processing from flowing out of an imprint device, while preventing a particle outside the imprint device from flowing into the space. <P>SOLUTION: The imprint device includes: a head 12 for holding a mold 11; a stage 14 for holding a substrate 13; a coating mechanism 20 for coating a resin on the substrate; a first partition wall 41 for forming a boundary between a first space A for imprint processing and a second space B outside thereof; and a second partition wall 40 for forming a boundary between the second space and a third space outside thereof. Pressure in the second space is adjusted in a manner to impede air flow between the first space and the third space through the second space. <P>COPYRIGHT: (C)2012,JPO&INPIT |
