METHOD OF FABRICATING FINE PATTERN ON SUBSTRATE USING SOLID FILM BARRIER

摘要

PURPOSE: A method for fabricating a fine pattern on a substrate using a solid film barrier is provided to form a fine pattern having a high aspect ratio by controlling the concentration of a functional ink and the thickness of a mask. CONSTITUTION: A filling solution is inserted to an opening(S200). A solid film is formed by a solid portion melted or dispersed by the filling solution(S300). A functional ink is spread to the opening(S400). The spread functional ink is solidified and a fine pattern is formed(S500). A mask is separated from a substrate(S600).