| 摘要 |
PURPOSE: A method for manufacturing a 5-gradation photo-mask and a method for transcribing the 5-gradation photo-mask are provided to form a micro-pattern with high precision by mixing a first anti-transmission film and a second anti-transmission film which has different exposure light transmission ratio. CONSTITUTION: A first anti-transmission film(16) is etched by using a second resist pattern(31) as a mask. A second anti-transmission film(17) is formed on a patterned light-shielding layer and the whole side of a substrate including the first anti-transmission film. A resist film formed on the second anti-transmission film is drawn and developed. A third resist pattern is formed in a region corresponding to a light-shielding part, a first anti-transmission part, and a third anti-transmission part. The second anti-transmission film is etched by using the third resist pattern as the mask.
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