发明名称 |
DEVICE USING POROUS METAL FOR ELECTRICAL CONNECTION AND WIRING CONNECTION METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a wiring connection method which can surely electrically-connects a substrate having a device structure formed thereon and a substrate for sealing the substrate when anodically-bonding the substrates. <P>SOLUTION: A device 4 comprises a first substrate 40 and a second substrate 45 which are anodically-bonded and electrically-connected via porous metals 51 and 52 which comprise one or more metals selected from gold, silver, platinum and palladium having a purity of 99.9 mass% or more and an average grain diameter of 0.005-1.0 μm. The wiring connection method comprises: forming the porous metal (bump) on at least one of a connection electrode part of the first substrate and a connection electrode part of the second substrate; superposing the first and second substrates so that the connection electrode parts of the first and second substrates face each other while sandwiching the bump; then anodically-bonding the both substrates and simultaneously electrically-connecting the connection electrode parts of the first and second substrates via the porous metal. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012049298(A) |
申请公布日期 |
2012.03.08 |
申请号 |
JP20100189433 |
申请日期 |
2010.08.26 |
申请人 |
TOHOKU UNIV;NIKKO CO;TANAKA KIKINZOKU KOGYO KK |
发明人 |
TANAKA HIDEJI;FUKUSHI HIDEYUKI;ESASHI MASAKI;MORI MAMORU;NAKAMURA DAISUKE;OKADA ATSUSHI;KOGASHIWA TOSHINORI;NISHIMORI TAKASHI;TANAKA KATSUHISA;KUSAMORI HIROYUKI |
分类号 |
H01L23/02;B81B3/00;B81C3/00 |
主分类号 |
H01L23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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