MANAGEMENT APPARATUS FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT, AND COMPUTER PROGRAM

摘要

The objective of the present invention is to provide a management apparatus for semiconductor manufacturing equipment, and a computer program, wherein an accurate process monitoring can be achieved on the basis of pattern images that were obtained. Proposed as an embodiment to achieve the above-mentioned objective is a management apparatus for semiconductor manufacturing equipment that is provided with: a library that has stored therein relationships between information about the shapes of a pattern in a plurality of positions, and exposure conditions of an exposure apparatus; and a calculation apparatus that compares shape information about a plurality of positions extracted from image information and shape information stored in the library, and extracts exposure conditions on the basis of a logical product of the range of a plurality of exposure conditions that correspond to the shape information about a plurality of positions extracted from the image information. Also proposed is a computer program for executing the above-mentioned processing.