ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERNING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which can achieve both excellent developability and excellent conformability to an immersion liquid, and a patterning method using the composition.

SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (B) which comprises at least one of a fluorine atom and a silicon atom and which contains a repeating unit represented by the following general formula (I-1) or (I-2).

COPYRIGHT: (C)2012,JPO&INPIT