The invention relates to a projection exposure apparatus (11) for semiconductor lithography comprising optical elements (1, 18), wherein at least one of the optical elements (1) has means (2) for contactlessly producing electric currents in the optical element (1) which are suitable for heating the at least one optical element (1) at least in regions.
申请公布号
WO2012028569(A1)
申请公布日期
2012.03.08
申请号
WO2011EP64796
申请日期
2011.08.29
申请人
CARL ZEISS SMT GMBH;EHM, DIRK HEINRICH;SCHMIDT, STEFAN-WOLFGANG;DIER, OLIVER
发明人
EHM, DIRK HEINRICH;SCHMIDT, STEFAN-WOLFGANG;DIER, OLIVER