发明名称 METHOD OF MANUFACTURING PHOTOSENSOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a reliable photosensor by suppressing the generation of air bubbles between a fixing member for fixing a semiconductor wafer and a cover member and the cover member. <P>SOLUTION: A method of manufacturing a photosensor comprises the steps of: preparing a semiconductor wafer provided with a plurality of pixel regions; forming on the semiconductor wafer a lattice-shaped salient that surrounds each of the plurality of pixel regions by a fixing member; preparing a translucent substrate having on the surface thereof a gap part consisting of at least one of a lattice-shaped groove narrower in width than the line width of the lattice-shaped salient made by the fixing member and a plurality of through-holes arranged in a lattice shape; fixing the semiconductor wafer and the translucent substrate by disposing the lattice-shaped salient and the gap part in a mutually facing posture so as to constitute a vent hole on the fixing member; and cutting the semiconductor wafer and the translucent substrate that have been fixed to divide the pixel regions into individual pieces. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012049401(A) 申请公布日期 2012.03.08
申请号 JP20100191323 申请日期 2010.08.27
申请人 CANON INC 发明人 MATSUKI YASUHIRO;SUZUKI TAKANORI;TSUZUKI KOJI;HASEGAWA MAKOTO;KOSAKA TADASHI;NAKAYAMA AKIYA
分类号 H01L31/10;H01L27/14 主分类号 H01L31/10
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