发明名称 POLYCRYSTALLINE SILICON AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide economical polycrystalline silicon having a low surface dust content. <P>SOLUTION: In the polycrystalline silicon containing fractured fragments of polycrystalline silicon, at least 90% of the fractured fragments have sizes described in the specification, silicon dust particle contents are less than 15 ppmw for particle sizes of less than 400 &mu;m, less than 14 ppmw for particle sizes of less than 50 &mu;m, less than 10 ppmw for particle sizes of less than 10 &mu;m and less than 3 ppmw for particle sizes of less than 1 &mu;m, and further, the polycrystalline silicon has surface metal impurities of 0.1-100 ppbw. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012046412(A) 申请公布日期 2012.03.08
申请号 JP20110183660 申请日期 2011.08.25
申请人 WACKER CHEMIE AG 发明人 PECH REINER;DORNBERGER ERICH
分类号 C01B33/02 主分类号 C01B33/02
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